We manufacture ArF photoresists for process applications with a film thickness range of 0.2µm to 6.0µm in relation to the 193nm wavelength.

In the ArF photoresist product line, we offer both positive and negative types, with solutions suitable for both dry and immersion processes.

If you are looking for an ArF photoresist solution for project development, we will provide more specific data for the product line upon your inquiry.