NIL (Nanoimprint Lithography) offers the precise and low cost lithography technology for the polymer nano structure's high-throughput patternization.
-Organic-Inorganic Hybrid, Heat-resistance,-Easy release, Transparency
-Transparency, Easy release, Young's modulus(100~1000MPa)-Dimension error < 5%(tunable shrinkage 1~5% ), Contact angle(60°~90°),-Flexible & Bendable
UV curable, Inkjet type, Transparency, Tunable viscosity, Good wetting, Strong adhesion force to the wafer and the polymer substrate, Residual layer: Below 50nm
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