YPP-3002 본문 “The working mechanism of a photoresist composition is that, during the exposure process, the photoacid generator produces acid upon receiving light, and this acid induces an acid-catalyzed reaction in the photoresist resin. In a positive photoresist composition, a deprotection reaction occurs, and through this reaction, the exposed and unexposed areas acquire different solubilities in the developer, thereby forming the desired pattern. apps