YPP-S10K
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The working mechanism of a photoresist composition is that, during the exposure process, the photoacid generator generates acid upon receiving light, and this acid triggers an acid-catalyzed reaction in the photoresist resin. In a positive photoresist composition, a deprotection reaction occurs, and through this reaction, the exposed and unexposed areas develop different solubilities in the developer, enabling the formation of the pattern.
