(Nanoimprint Lithography) 고분자 나노 구조의 high-throughput 패턴화를 위한 정밀한 lithography 기술을 제공합니다.
-Organic-Inorganic Hybrid, Heat-resistance,-Easy release, Transparency
-Transparency, Easy release, Young's modulus(100~1000MPa)-Dimension error < 5%(tunable shrinkage 1~5% ), Contact angle(60°~90°),-Flexible & Bendable
UV curable, Inkjet type, Transparency, Tunable viscosity, Good wetting, Strong adhesion force to the wafer and the polymer substrate, Residual layer: Below 50nm
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