EUV Photoresist

We manufacture EUV photoresists for process applications with a film thickness range of 10nm to 100nm in relation to the 13.5nm wavelength.
In the EUV photoresist product line, we offer both positive and negative types, with optimized solutions for high sensitivity and low LER (Line Edge Roughness).
If you are looking for an EUV photoresist solution for project development, we will provide more specific data for the product line upon your inquiry.