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Transparent Photoresist
UV Imprint Resin
Stripper
LED
LCD
A Total of
25
hit(s)
Subject
Contents
Name
YPP-3002
In the mechanism of the structure of the photoresist, acid is formed from the photo acid generator that gets light from the exposure process. Also, the acid causes the resin's acid catalysed reaction in the photoresist. An antiprotection reaction occurs in the positive photoresist composition, and patterns are formed with a solubility difference of the developer (developing liquid) in the exposed area and non-exposed area through the reaction.
YGR-8100AL / YGR-8200AL
Metal stripper (Single type)
YGR-4100AL
Metal stripper (Batch type)
YMR-1600 / YMR-1700
Stripper for the removal of Al post etch residue
YNIL-HR
-Organic-Inorganic Hybrid, Heat-resistance,
-Easy release, Transparency
YNIL-M1 / M2 / M3
-Transparency, Easy release, Young's modulus(100~1000MPa),
-Dimension error < 5%(tunable shrinkage 1~5% ), Contact angle(60°~90°),
-Flexible & Bendable
YNIL-R1 / R2 / R3
UV curable, Inkjet type, Transparency, Tunable viscosity, Good wetting, Strong adhesion force to the wafer and the polymer substrate, Residual layer: Below 50nm
YTNP-2030
Transparent Photoresist
YTNP-2015
Transparent Photoresist
YTNP-2005
Transparent Photoresist
1
2
