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I-Line Photoresist
Bump Photoresist
KrF Photoresist
TSV Thick Photoresist
BARC
TARC
Developer
Etchant
Promoter
Rinsing Solution
Spin On Carbon Hardmask
CMP
Wafering
A Total of
3
hit(s)
Subject
Contents
Name
Developer
As a material used in the last stage of the photo development process, this product is a material used in the process of forming patterns on the circuit by selectively removing the exposed areas and non-exposed areas.
DE-Y250L
TMAH type developer for color filter resist
DV-7000D / DE-Y2200 / DV-400 / DV-400S
TMAH type developer
1
