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I-Line Photoresist
Bump Photoresist
KrF Photoresist
TSV Thick Photoresist
BARC
TARC
Developer
Etchant
Promoter
Rinsing Solution
Spin On Carbon Hardmask
CMP
Wafering
A Total of
6
hit(s)
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Contents
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KrF Photoresist
We manufacture KrF photoresists for process application with 0.30um to 12.0um of film thickness in relation to 248nm wavelength. In the KrF photoresist product line, we manufacture both positive and negative type photoresists. If you are looking for a krF photoresist solution for project development, we will provide more specific data for the product line when you make an inquiry to us.
YCKN-2954
-Target : Thickness 0.54um (Res. 180nm, 250nm)
-Purpose of use : Implant & Etch Layer
YCKN-4530
-Target : Thickness 0.30um (Res. 180nm)
-Purpose of use : Implant Layer
YKN-510
-Target : Thickness 0.54um (Res. 180nm, 250nm)
-Purpose of use : Implant & Etch Layer
YCKP-1654
-Target : Thickness 0.54um (Res. 180nm, 250nm)
-Purpose of use : Implant & Etch Layer
YKP-503
-Target : Thickness 0.54um (Res. 180nm, 250nm)
-Purpose of use : Implant & Etch Layer
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